Model analysis of effect of diffraction focus characteristics of microlens arrays on parallel laser direct writing quality |
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Authors: | Jiubin Tan Jian Liu Hui Zhang Chenguang Zhao |
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Affiliation: | Ultra-precision Optical and Electronic Instrument Engineering Center, Harbin Institute of Technology, Harbin, Heilongjiang 150001, PR China |
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Abstract: | In order to study the effect of diffraction focusing characteristics of microlens arrays on the parallel laser direct writing quality, we use nonparaxial approximation to analyze the diffraction focus characteristic of a single microlens, take into consideration the cross-talk effect of a number of microlenses on the diffraction focusing characteristics of an array, and establish a theoretical focusing intensity model of a microlens array to describe the influence of a change in F-number and/or center distance on the diffraction focusing characteristics of a parallel laser direct writing system while incident writing laser is normal. Numerical simulation results indicate that there is a cross-talk effect among microlenses which increases as the F-number increases when the center distance is the same as the smaller aperture, and parallel writing quality can be improved by reducing or totally eliminating the cross-talk effect by reducing F-number and/or increasing center distance. |
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Keywords: | Microlens array Diffraction focusing Cross-talk effect Parallel laser direct writing |
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