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The effects of O deficiency on the electronic structure of rutile TiO2
Authors:Gunhild U. von Oertzen
Affiliation:a Ian Wark Research Institute, University of South Australia, Mawson Lakes, SA 5095, Australia
b Applied Center for Structural and Synchrotron Studies, University of South Australia, Mawson Lakes, SA 5095, Australia
Abstract:Ab initio density functional calculations (plane wave GGA, CASTEP) were performed to determine the effect of O deficiency on the electronic structure of rutile, TiO2. O deficiency was introduced through either the removal of O or the insertion of interstitial Ti atoms. At physically realistic concentrations of O vacancies in the rutile lattice (i.e. 25% and less) O deficiency results in the population of the bottom of the conduction band, the location of the Ti 3d orbitals in the pure structure, increasingly with increasing vacancy concentration. We propose that this could be confused with the formation and population of gap states especially where O vacancies occur in isolated positions in the lattice. In contrast, Ti interstitials introduce a defect state into the energy gap, without an overall reduction in the size of the energy gap. O vacancies result in a spin polarized solution, whereas Ti interstitials do not.
Keywords:A. Semiconductors   C. Ab initio calculations   D. Electronic structure
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