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Development of a new total reflection X‐ray fluorescence instrument using polycapillary X‐ray lens
Institution:1. Department of Applied Chemistry, Graduate School of Engineering, Osaka City University, 3–3‐138 Sugimoto, Sumiyoshi‐ku, Osaka 558–8585, Japan;2. PRESTO, JST, 4–1‐8 Honcho Kawaguchi, Saitama 332–0012, Japan;3. Institute of Low Energy Nuclear Physics, Beijing Normal University, No. 19, Xin Jie Kou Wai Da Jie, Beijing 100875, China;1. Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan;2. Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;3. PRESTO, Japan Science and Technology Agency, Saitama 332-0012, Japan;1. Research Network NANOTEC–SUT on Advanced Nanomaterials and Characterization, School of Physics, Suranaree University of Technology, Nakhon Ratchasima, 30000, Thailand;2. Thailand Center of Excellence in Physics, Ministry of Higher Education, Science, Research and Innovation, Bangkok, 10400, Thailand;3. Faculty of Science, Nakhon Phanom University, Nakhon Phanom, 48000, Thailand;4. Synchrotron Light Research Institute, Nakhon Ratchasima, 30000, Thailand;5. Department of Applied Physics, Faculty of Sciences and Liberal Arts, Rajamangala University of Technology Isan, Nakhon Ratchasima, 30000, Thailand;6. UVSOR-III Synchrotron, Institute for Molecular Science, Myodaiji, Okazaki, 444-8585, Japan;7. Synchrotron SOLEIL, l''Orme des Merisiers, Saint-Aubin, F-91192, Gif-sur-Yvette Cedex, France;1. State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004, China;2. Key Laboratory for Microstructural Material Physics of Hebei Province, School of Science, Yanshan University, Qinhuangdao 066004, China;1. Guizhou University, Guiyang 550000, PR China;2. The Key Laboratory of Chemistry for Natural Products of Guizhou Province, Chinese Academy of Sciences, Guiyang 550002, PR China
Abstract:A new TXRF instrument combined with micro‐XRF analytical technique was proposed. An X‐ray micro‐beam was obtained by using a polycapillary X‐ray lens. The evaluated diameter of the X‐ray beam at the focal distance was 35 μm. In order to satisfy the total reflection condition of the present instrument, we attempted to cut the X‐ray micro‐beam above the critical angle of the total reflection with a slit. After the slit was applied, a clear critical angle could be observed. Using this proposed instrumental setup, we applied this to the analysis of a single particle on a flat Si substrate.
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