p型硅片上激光诱导局部化学沉镍

在以肼为还原剂的碱性化学镀镍溶液中实现ｐ型单晶硅片上激光诱导微区化学沉镍，讨论了激光能量、照射时间对镍沉积层的影响，使用ＳＥＭ、ＡＥＳ和ＲＢＳ等方面对镀层的形貌、性质进行了分析。激光诱导化学沉积得到了均匀致密、结合力好的纯镍镀层。镀层与基体间具有Ｓｃｈｏｔｔｋｙ接触特性。

Laser-Induced Selective Deposition of Nickel on p-Type Silicon

Selective deposition of thin nickel films on p-type silicon was obtained in a hy drazine-based conventional electroless nickel plating solution at the ambient temperature under laser irradiation. Composition and properties of the deposits were investigated using SEM,AES and RBS techniques.The deposits are in Schottky barrier contact with p-type silicon.The mechanism involved in the deposition process was also discussed.