Degradation mechanism of two-dimensional electron gas density in high Al-content AlGaN/GaN heterostructures |
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Authors: | Zhang Jin-Cheng Zheng Peng-Tian Zhang Juan Xu Zhi-Hao Hao Yue |
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Affiliation: | Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China |
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Abstract: | This paper finds that the two-dimensional electron gas density inhigh Al-content AlGaN/GaN heterostructures exhibits an obvioustime-dependent degradation after the epitaxial growth. Thedegradation mechanism was investigated in depth using Hall effectmeasurements, high resolution x-ray diffraction, scanning electronmicroscopy, x-ray photoelectron spectroscopy and energy dispersivex-ray spectroscopy. The results reveal that the formation of surfaceoxide is the main reason for the degradation, and the surfaceoxidation always occurs within the surface hexagonal defects forhigh Al-content AlGaN/GaN heterostructures. |
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Keywords: | degradation mechanism two-dimensional electron gas AlGaN/GaN heterostructures surfaceoxidation |
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