| 衍射光学元件的反应离子束蚀刻研究 |
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| 引用本文： | 杨李茗 虞淑环. 衍射光学元件的反应离子束蚀刻研究[J]. 光子学报, 1998, 27(2): 147-151 |
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| 作者姓名： | 杨李茗 虞淑环 |
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| 作者单位： | 浙江大学现代光学仪器国家重点实验室 |
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| 基金项目： | 国家高技术航天863资助 |
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| 摘 要： | 本文提出了一种制作衍射光学元件的新方法——-反应离子束蚀刻法.对此技术研究的结果表明:反应离子束蚀刻法具有高蚀刻速率、蚀刻过程各向异性好、蚀刻参数控制灵活等特点,对于衍射光学元件和微光学元件的精细结构制作十分有利.本文详细总结了反应离子束蚀刻过程中各工艺参数对蚀刻速率的影响,并在红外材料上制作了Dammann分束光栅.
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| 关 键 词： | 反应离子束蚀刻 衍射光学元件 蚀刻工艺 |
| 收稿时间： | 1997-06-23 |
REACTIVE ION BEAM ETCHING FOR DIFFRACTIVE OPTICAL ELEMENTS |
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| Yang Liming,Yu Shuhuan,Xu Qiao,Shu Xiaowu,Yang Guoguang State Key Laboratory of Optical Instrumentation,Zhejiang University,Hangzhou Received date:--. REACTIVE ION BEAM ETCHING FOR DIFFRACTIVE OPTICAL ELEMENTS[J]. Acta Photonica Sinica, 1998, 27(2): 147-151 |
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| Authors: | Yang Liming Yu Shuhuan Xu Qiao Shu Xiaowu Yang Guoguang State Key Laboratory of Optical Instrumentation Zhejiang University Hangzhou Received date:-- |
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| Affiliation: | Yang Liming,Yu Shuhuan,Xu Qiao,Shu Xiaowu,Yang Guoguang State Key Laboratory of Optical Instrumentation,Zhejiang University,Hangzhou 310027 Received date:1997-06-23 |
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| Abstract: | This paper presents a novel method,Reactive ion Beam Etching (RIBE) technique,for fabricating Diffractive Optical Elements (DOEs).The research demonstrates that RIBE technique has many characters,such as high etching rate,good isotropy and flexible etching parameters control.This technique is advantageous for manufacturing fine structures of DOEs and micro optical elements.The parameters′ influences on etching rate are given.This method is used in fabricating DAMMANN Gratings in infrared materials. |
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| Keywords: | Reactive ion beam etching (RIBE) Diffractive optical elements (DOEs) Etching processes |
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