The six‐armed polystyrenes and poly(methyl methacrylate)s with a triphenylene core showed different self‐assembling patterns, isolated cylinders for polySt on mica and highly ordered cylindrical pores for polyMMA on a silicon wafer. With a decrease of polymer concentration in tetrahydrofuran (THF), the size and height of cylinders decreased for polySt, but for polyMMA, the size and depth of the cylindrical pores increased. Slow evaporation of the solvent and a low molecular weight favored the formation of regular patterns.
AFM images of self‐assembling patterns of polySt 1a on mica (A) and of polyMMA 2a on silicon wafer (B).
