Optimized hole injection with strong electron acceptors at organic-metal interfaces |
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Authors: | Koch Norbert Duhm Steffen Rabe Jürgen P Vollmer Antje Johnson Robert L |
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Affiliation: | Institut für Physik, Humboldt-Universit?t zu Berlin, Newtonstrasse 15, D-12489 Berlin, Germany. norbert.koch@physik.hu-berlin.de |
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Abstract: | The energy-level alignment at interfaces between three electroactive conjugated organic materials and Au was systematically varied by adjusting the precoverage of the metal substrate with the electron acceptor tetrafluoro-tetracyanoquinodimethane (F4-TCNQ). Photoelectron spectroscopy revealed that electron transfer from Au to adsorbed F4-TCNQ was responsible for lowering the hole-injection barrier by as much as 1.2 eV. This novel interface modification scheme is independent of the charge transfer complex formation ability of the organic materials with the electron acceptor. |
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