| 氮流量对磁控溅射法制备氮化钛薄膜光学性能的影响 |
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| 引用本文： | 黄佳木,徐成俊.氮流量对磁控溅射法制备氮化钛薄膜光学性能的影响[J].光学学报,2005,25(9):293-1296. |
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| 作者姓名： | 黄佳木 徐成俊 |
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| 作者单位： | 重庆大学,材料学院,重庆,400045;重庆大学,材料学院,重庆,400045 |
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| 摘 要： | 采用磁控溅射方法在载波片和Al基片上制备了氮化钛薄膜；通过改变N2流量来改变薄膜中N／Ti原子比例。采用分光光度计和扫描隧道显微镜测试手段对氮化钛薄膜光学性能随N2流量变化的规律进行了研究。薄膜反射率光谱和扫描隧道图谱分析表明，氮化钛薄膜主要遵循自由载流子光吸收机制，随着N含量的增加，溥膜中的自由电子数目不断减少，等离子体频率逐渐红移，反射率降低，薄膜颜色发生变化。从薄膜扫描隧道谱（STS）可知，TiN薄膜表现出类似金属的光学性能，并且其禁带宽度Eg=1．64eV。
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| 关 键 词： | 薄膜光学 光学性能 磁控溅射 电子结构 氮化钛 |
| 文章编号： | 0253-2239（2005）09-1293-4 |
| 收稿时间： | 2004-10-15 |
| 修稿时间： | 2004-12-25 |
Effect of N2 Mass Flow Rate On the Optical Property of Titanium Nitride Films Deposited by Magnetron Sputtering |
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| Huang Jiamu,XU Chengjun.Effect of N2 Mass Flow Rate On the Optical Property of Titanium Nitride Films Deposited by Magnetron Sputtering[J].Acta Optica Sinica,2005,25(9):293-1296. |
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| Authors: | Huang Jiamu XU Chengjun |
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| Abstract: | The titanium nitride thin films were deposited on slides and Al substrates by magnetron sputtering and the variation of N/Ti atom ratios was controlled by selected N_2 mass flow rate.The effect of N_2 mass flow rate on the optical properties of titanium nitride films was analyzed via spectrophotometer and scanning tunneling microscopy(STM) methods.The results of reflectivity spectrum and scanning tunneling spectrum(STS) showed that titanium nitride thin films mainly conform to free-carrier absorption mechanism,and as the N content increases,the numbers of free electrons of the films reduce consequently and the plasma frequency keeps shifting to lower energy,so that the reflectivity of films is downhill and the color of films varies regularly.STS spectra of TiN indicated that the TiN film exhibits metallic optical property and the band gap is 1.64 eV. |
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| Keywords: | thin film optics optical property magnetron sputtering electronic structure titanium nitride |
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