Annealing behavior of spin density in UHV evaporated amorphous silicon |
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| Authors: | Takao Yonehara Toshio Saitoh Hiroshi Kawarada Tohru Hirata Masakazu Kakumu Iwao Ohdomari |
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| Institution: | School of Science and Engineering, Waseda University, Shinjuku-ku, Tokyo, Japan |
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| Abstract: | The ESR of amorphous silicon films evaporated in UHV has been measured at room temperature. Up to 900°C the annealing behavior of the spin density in the amorphous silicon films is quite different from that of films deposited in conventional HV. |
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