| Mo2C膜表面粗糙化规律的计算机模拟 |
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| 引用本文： | 冉扬强,郑瑞伦,陈洪,平荣刚,吕弋. Mo2C膜表面粗糙化规律的计算机模拟[J]. 化学物理学报(中文版), 2000, 13(4): 461-467. DOI: 10.1088/1674-0068/13/4/461-467 |
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| 作者姓名： | 冉扬强 郑瑞伦 陈洪 平荣刚 吕弋 |
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| 作者单位： | 冉扬强,郑瑞伦,陈洪,平荣刚,Ran Yangqiang,Zheng Ruilun,Chen Hong,Ping Ronggang(西南师范大学物理系重庆 400715);吕弋,Lu Yi(西南师范大学化学系重庆 400715) |
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| 摘 要： | 引入晶粒边界修正，改进了Mo2C膜表面粗糙化物理模型，将DT2模型推广到包括有温度的情况，对Mo2C膜表面形态进行计算机模拟并统计模拟图的高度分布，确定表面粗糙度随沉积时间和基底温度的变化规律。结果表明：引入晶粒边界修正大大促进了理论与实验结果的一致，Mo2C膜表面粗糙化属快速粗造化，粗造度随基底温度升高而非线性地增大。
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| 关 键 词： | Mo2C膜 计算机模拟 表面粗造度 |
Simulation of the Roughening Law for Mo2C Film Surface |
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| Ran Yangqiang,Zheng Ruilun,Chen Hong,Ping Ronggang,Lu Yi. Simulation of the Roughening Law for Mo2C Film Surface[J]. Chinese Journal of Chemical Physics, 2000, 13(4): 461-467. DOI: 10.1088/1674-0068/13/4/461-467 |
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| Authors: | Ran Yangqiang Zheng Ruilun Chen Hong Ping Ronggang Lu Yi |
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| Abstract: | The roughening physics model of Mo2C film surface is improved by introduction the crystalin boundary.The DT2 model is extended by including the temperature.The surface of thin Mo2C film is simulated in computer and the hight of difference distribution is given by means of statistics.The change of roughness with deposited time and temperature is determined.The obtained results show that,the agreement with experimental date is improved by crystalline boundary.The roughening of Mo2C film is rapid roughening and the rougheness increase with increasing the substrate temperature rapidly. |
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| Keywords: | Mo2C thin film Simulation Roughness |
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