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以MgO为缓冲层的硅基铌酸锶钡薄膜取向特性与其波导结构的设计研究
引用本文:曹晓燕,叶辉.以MgO为缓冲层的硅基铌酸锶钡薄膜取向特性与其波导结构的设计研究[J].光子学报,2004,33(3):303-306.
作者姓名:曹晓燕  叶辉
作者单位:浙江大学现代光学仪器国家重点实验室,浙江大学,杭州,310027;浙江大学现代光学仪器国家重点实验室,浙江大学,杭州,310027
基金项目:浙江省自然科学基金 (50 0 0 77)资助项目
摘    要:采用溶胶-凝胶法在Si(100)基片上制备出择优取向的MgO薄膜,随后在其上生长出具有择优取向的铌酸锶钡铁电薄膜.实验发现,MgO缓冲层的应用可以大大提高SBN薄膜的择优取向性能.同时,用五层对称理想波导耦合模理论,以SBN为波导层,分析了波导损耗与厚度的关系. 通过对计算出的理想结果与实际相结合,以及对SBN在生长过程工艺与损耗关系的研究,制备出高质量、低损耗的SBN薄膜,为其在电光波导调制器等微系统中的应用打下良好的基础.

关 键 词:铌酸锶钡  MgO缓冲层  损耗
收稿时间:2003-04-24
修稿时间:2003年4月24日

Study of Preferred Orientation Growth of SBN Thin Films with MgO Bufferlayer on the Silicon Substrate and Search of Waveguide Structure
Institution:(State Key Lab of Modern Optical Instrumentation,Zhejiang University, Hangzhou 310027)
Abstract:Highly preferred orientation ferroelectric SBN thin films have been grown on MgO-buffered Si(100) substrate with the Sol-Gel method. The results show that the preferred orientation of SBN film can be considerably improved by adding the MgO buffer layer. Based on the theory of ideal five layers symmetrical waveguide-coupling film, this paper analyses the relationship of the optical loss and the thickness of the waveguide layer and the MgO-buffered layer. After investigating the connection between artwork and loss during SBN growth, single-crystal SBN ferroelectric thin film can be developed on Si(001) substrate with outstanding orientation. Therefore we can employ SBN having large E-O coefficient as electro-optical waveguide and make good use of it in micro system
Keywords:Strontium barium niobate  MgO buffer layer  Optical l oss
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