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单根In掺杂ZnO纳米带场效应管的电学性质
引用本文:唐欣月,高红,潘思明,孙鉴波,姚秀伟,张喜田.单根In掺杂ZnO纳米带场效应管的电学性质[J].物理学报,2014,63(19):197302-197302.
作者姓名:唐欣月  高红  潘思明  孙鉴波  姚秀伟  张喜田
作者单位:光电带隙材料省部共建教育部重点实验室, 哈尔滨师范大学物理与电子工程学院, 哈尔滨 150025
基金项目:国家自然科学基金(批准号:11074060,51172058);黑龙江省教育厅科学技术重点研究项目(批准号:12521z012);黑龙江省研究生创新科研项目(2013)资助的课题~~
摘    要:采用化学气相沉积法合成了In掺杂ZnO纳米带,并对其进行了X射线衍射、光致发光及透射电镜表征.基于单根纳米带,采用廉价微栅模板法制备了背栅场效应管,利用半导体参数测试仪测量了场效应管的输出(Ids-Vds)和转移(Ids-Vgs)特性,得出相关电学参数,其中迁移率值为622 cm2·V-1·s-1,该值明显优于包括ZnO在内的大多数材料;讨论了迁移率提高的可能原因.

关 键 词:ZnO  纳米带  场效应管  迁移率
收稿时间:2014-03-27

Electrical characteristics of individual In-dop ed ZnO nanob elt field effect transistor
Tang Xin-Yue , Gao Hong , Pan Si-Ming , Sun Jian-Bo , Yao Xiu-Wei , Zhang Xi-Tian.Electrical characteristics of individual In-dop ed ZnO nanob elt field effect transistor[J].Acta Physica Sinica,2014,63(19):197302-197302.
Authors:Tang Xin-Yue  Gao Hong  Pan Si-Ming  Sun Jian-Bo  Yao Xiu-Wei  Zhang Xi-Tian
Institution:Tang Xin-Yue;Gao Hong;Pan Si-Ming;Sun Jian-Bo;Yao Xiu-Wei;Zhang Xi-Tian;Key Laboratory for Photonic and Electronic Bandgap Materials, Ministry of Education, School of Physics and Electronic Engineering, Harbin Normal University;
Abstract:Back-gate field effect transistors based on In-doped ZnO individual nanobelts have been fabricated using the low-cost microgrid template method. The output (Ids-Vds) and transfer (Ids-Vgs) characteristic curves for the transistors are measured, and the mobility is derived to be 622 cm2· V-1· s-1. This value is obviously superior to those for most of materials including pure ZnO in the literature, and possible influence factors have also been discussed.
Keywords: ZnO nanobelt field effect transistor mobility
Keywords:ZnO  nanobelt  field effect transistor  mobility
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