Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film |
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Authors: | A E Komlev V I Shapovalov N S Shutova |
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Institution: | 1. St. Petersburg State Electrotechnical University (LETI), ul. Prof. Popova 5, St. Petersburg, 197238, Russia
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Abstract: | A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron. |
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