| Study on the material-remove mechanism of SiC surface polishing |
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| 作者姓名： | Fan Di |
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| 作者单位： | Fan Di:Key Laboratory of Optical System Advanced Manufacturing Technology, Chinese Academy of Sciences, Changchun 130033, ChinaChangchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
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| 摘 要： |
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| 收稿时间： | 2013/12/7 |
Study on the material-remove mechanism of SiC surface polishing |
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| Fan Di.Study on the material-remove mechanism of SiC surface polishing[J].中国光学快报(英文版),2014,12(s2):22201. |
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| Abstract: | |
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| Keywords: | 220 4610 220 5450 240 5450 |
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