Formation of Nanodimensional SiO2 Films on the Surface of a Free Si/Cu Film System by $${\text{O}}_{2}^{ + }$$ Ion Implantation |
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| Authors: | Umirzakov B E Ruzibaeva M K Isakhanov Z A Erkulov R M |
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| Institution: | 1.Institute of Ion-Plasma Technologies, Academy of Sciences of Uzbekistan, 100125, Tashkent, Uzbekistan
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| Abstract: | Technical Physics - The composition and parameters of energy bands in thin SiO2 films grown on the surface of a free Si/Cu film system have been studied. It has been shown that unlike SiO2 films... |
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