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多层高温超导薄膜研究
引用本文:高晓昕,季鲁,葛德勇,赵新杰,何明,张旭,宋峰,李伟. 多层高温超导薄膜研究[J]. 低温与超导, 2013, 0(2): 19-22,74
作者姓名:高晓昕  季鲁  葛德勇  赵新杰  何明  张旭  宋峰  李伟
作者单位:南开大学信息技术科学学院;南开大学物理学院
基金项目:国家自然科学基金项目(61101018;51002081;61171028;61176119);中央高校基本科研业务费专项资金资助
摘    要:文中以LaAlO3为衬底,制作了一层Tl-2212高温超导薄膜,并在薄膜上生长一层较薄的CeO2缓冲层,然后再在上面生长一层Tl-2212高温超导薄膜。经过测量,研究了多层膜结构对超导薄膜临界电流密度的影响。结果显示,在缓冲层的结晶过程中超导薄膜的晶格受到影响,结晶过程中的处理很容易诱导上面一层Tl-2212超导薄膜产生杂相,导致临界电流密度降低。

关 键 词:高温超导薄膜  磁通钉扎  多层膜  临界电流密度  Tl-2212

Investigation of multilayered high temperature superconducting thin film
Gao Xiaoxin,Ji Lu,Ge Deyong,Zhao Xinjie,He Ming,Zhang Xu,Song Feng,Li Wei. Investigation of multilayered high temperature superconducting thin film[J]. Cryogenics and Superconductivity, 2013, 0(2): 19-22,74
Authors:Gao Xiaoxin  Ji Lu  Ge Deyong  Zhao Xinjie  He Ming  Zhang Xu  Song Feng  Li Wei
Affiliation:1.College of Information Technical Science,Nankai University,Tianjin 300071,China; 2.College of Physics,Nankai University,Tianjin 300071,China)
Abstract:In this paper,Tl-2212 high temperature superconducting thin film was produced on LaAlO3 substrate,then CeO2 buffer layer was produced on the film,and then another Tl-2212 superconducting thin film on the buffer layer.The effect on critical current density of superconducting film of multilayered structure was studied.And the results show that during the crystallization of buffer layer the crystal of superconducting thin film was destroyed,where the impure phase of the Tl-2212 thin film on it was produced,causing the decrease of the critical current density.
Keywords:High-temperature superconducting thin films  Pinning  Multilayered film  Critical current density  Tl-2212
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