Photoelectron escape from iron oxide

Iron oxide of nanometer thickness were grown in situ by step-by-step oxidation of an iron foil to measure the escape probabilities of O 1s photoelectrons as a function of depth of origin, the so-called emission depth distribution function (EDDF), and the mean escape depth (MED). To record photoelectron spectra for a wide range of emission angles, the X-ray excitation source was positioned on the opposite side of the iron foil with respect to the analyzer. To excite photoelectrons on the side of the foil surface adjacent to the analyzer, the foil was made thin enough to be semitransparent to the X-ray radiation. The O 1s spectra were recorded for a wide range of oxide thicknesses until no features of metallic iron were recognized in the photoelectron spectra. The escape probability of the O 1s photoelectrons in the iron oxide was derived from the oxide-thickness dependence of the O 1s peak areas. The resulting EDDF reached a maximum beneath the oxide surface for X-ray incidence and electron-emission angles located along the surface normal. For the same incidence angle and an emission angle of 60°, the escape probability could be well approximated by a simple exponential function. The mean escape depths were obtained for both experimental geometries and agreed well with the available theory.