Modelling the voltammetric study of intercalation in a host structure: application to lithium intercalation in RuO2 |
| |
| Authors: | M. Armand F. Dalard D. Deroo C. Mouliom |
| |
| Affiliation: | Laboratoire d''Energétique Electrochimique, L.A. CNRS no. 265, Domaine Universitaire B.P. 75, 38402 Saint Martin d''Heres Cedex, France |
| |
| Abstract: | Intercalation process kinetics have been studied theoretically for the case of potential sweep voltammetry. The influence of the thickness (or the particle radius) of the “host” material and the potential sweep rate has been determined between the limits of thin film diffusion and semi-infinite diffusion for a reversible process. Experimental data have been obtained with the cell: RuO2/LiClO4-PEO/Li. The theoretical results have been used to calculate the diffusion coefficient of lithium in the “host” structure RuO2 at 80°C, giving an approximate value of 1.6 × 10?11 cm2 s?1 |
| |
| Keywords: | Author to whom all correspondence should be addressed. |
| 本文献已被 ScienceDirect 等数据库收录！ |
