Region‐Selective Deposition of Core–Shell Nanoparticles for 3 D Hierarchical Assemblies by the Huisgen 1,3‐Dipolar Cycloaddition

A method for the region‐selective deposition of nanoparticles (NPs) by the Huisgen 1,3‐dipolar cycloaddition is presented. The approach enables defined stacking of various oxide NPs in any order with control over layer thickness. Thereby the reaction is performed between a substrate, functionalized with a self‐assembled monolayer of an azide‐bearing phosphonic acid (PA) and aluminum oxide (AlO_x) NPs functionalized with an alkyne bearing PA. The layer of alkyne functionalized AlO_x NPs is then used as substrate for the deposition of azide‐functionalized indium tin oxide (ITO) NPs to provide a binary stack. This progression is then conducted with alkyne‐functionalized CeO₂ NPs, yielding a ternary stack of NPs with three different NP cores. The stacks are characterized by AFM and SEM, defining the region‐selectivity of the deposition technique. Finally, these assemblies have been tested in devices as a dielectric to form a capacitor resulting in a dramatic increase in the measured capacitance.