首页 | 本学科首页   官方微博 | 高级检索  
     


Two-dimensional modeling and simulation for dynamic sheathexpansion during plasma immersion ion implantation
Authors:Shu Qin Yuanzhong Xhou Chung Chan
Affiliation:Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA;
Abstract:A pseudo two-dimensional (2-D) analytical model and a 2-D plasma simulator PDP2 code have been utilized to characterize ion-matrix sheath and dynamic sheath expansion during the plasma immersion ion implantation process. The pseudo 2-D model is very simple by involving two geometry factors and yields an acceptable accuracy under the current process conditions. Good agreement between the pseudo 2-D model and PDP2 simulation was observed
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号