Abstract: | ESCA has been used to characterize films deposited from perfluorobenzene and perfluorobenzene/benzene vapors during plasma polymerization and irradiation with vacuum ultraviolet light. The films deposited by both methods are shown to be essentially the same. This indicates that similar electronically excited states are involved in the formation of the precursors to deposition in both methods and that reaction mechanisms involving ions do not need to be considered for the plasma polymerization of the monomers investigated. |