Ordered ultra thin ZnO films on metal substrate |
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Authors: | Donghui Guo Mingshan Xue Qinlin Guo Kehui Wu Jiandong Guo EG Wang |
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Institution: | aBeijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, PO Box 603, Beijing 100190, PR China |
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Abstract: | Ultra thin ZnO films were prepared on metal Mo(1 1 0) substrate under ultrahigh vacuum conditions either by depositing Zn in 10−5 Pa oxygen or by oxidizing pre-deposited Zn films. The films were characterized in situ by various surface analytical techniques, including Auger electron spectroscopy, X-ray and ultraviolet photoelectron spectroscopies, low energy electron diffraction and high resolution electron energy loss spectroscopy. The results indicate that a long-range ordered and stoichiometric ZnO films are formed along its 0 0 0 1] direction. The annealing experiments show that as-prepared ZnO films are thermal stable until 800 K. This study provides constructive information to further understand the growth mechanism of ZnO films on different substrates. |
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Keywords: | ZnO thin films ZnO growth on metal Surface analysis Electronic structure |
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