Fragmentation of dodecanethiol molecules: application to self-assembled monolayer damage in atom lithography

Atom lithography commonly employs self-assem- bled monolayers (SAMs) of alkanethiols which act as resists to protect prepared surfaces. Metastable atomic species such as helium are used to damage the resist, enabling pattern transfer via mask lithography, followed by wet chemical etching. The damage mechanism is, however, not well understood. Here we report studies of fragmentation of dodecanethiol (DDT) molecules embedded in helium nano-droplets that have been irradiated by an electron beam. The results of the charge-transfer fragmentation process provide the first experimental data on the damage mechanisms that occur in the metastable helium/SAM interaction. Received: 20 September 1999 / Revised version: 6 December 1999 / Published online: 8 March 2000