溅射功率对金属锰膜光学性质的影响

采用磁控溅射方法在Si（111）基片上制备金属锰膜，用椭圆偏振光谱在入射光子能量为2.0–4.0 eV范围内研究了溅射功率对薄膜光学性质的影响. 利用德鲁得-洛伦兹色散模型对椭偏数据进行拟合，结果表明在测量范围内随溅射功率增加薄膜的折射率减小；消光系数随入射光子能量增加先增加后减小，在3.0 eV附近处出现极大值，并且极大值所处的位置随溅射功率增加而向低能方向移动，这主要与溅射沉积的锰薄膜的质量有关，且随溅射功率的增加薄膜的消光系数逐渐趋近于金属锰的数值. 研究结果还表明溅射功率的增加减少了薄膜中的空隙，有利于薄膜的生长.关键词：磁控溅射金属锰膜椭圆偏振光谱德鲁得-洛伦兹色散模型

Influence of sputtering power on the optical properties of metal manganese film

In this paper, spectroscopic ellipsometry with an incident photon energy range of 2.0–4.0 eV is used to investigate the optical properties of Mn films deposited on silicon substrates at different sputtering powers. The ellipsometric data are analyzed by Drude and Lorenz oscillators dispersion model. The results show that the refractive index of the film decreases with the increase of the sputtering power. The extinction coefficient of the Mn film increases when the energy of photons is less than 3.0 eV and decreases when the energy of photons is in a range of 3.0–4.0 eV, and it arrives at an extremum at about 3.0 eV. The extremum shows a red-shift with the sputting power increasing from 60 to 100 W, which is dependent on the quality of the Mn film. With the increase of sputtering power, the extinction coefficient of the film approaches to that of metal manganese. The results also imply that the voids in the film decrease with the increase of the sputtering power, which is conducive to the growth of the films.
Keywords：magnetron sputteringmetal manganese filmspectroscopic ellipsometryDrude and Lorenz oscillators’dispersion model