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Xe介质极紫外光源时间特性及最佳条件研究
引用本文:赵永蓬,徐强,肖德龙,丁宁,谢耀,李琦,王骐.Xe介质极紫外光源时间特性及最佳条件研究[J].物理学报,2013,62(24):245204-245204.
作者姓名:赵永蓬  徐强  肖德龙  丁宁  谢耀  李琦  王骐
作者单位:1. 哈尔滨工业大学, 可调谐(气体)激光技术国家级重点实验室, 哈尔滨 150080;2. 北京应用物理与计算数学研究所, 北京 100088;3. 中国科学院长春光学精密机械与物理研究所, 应用光学国家重点实验室, 长春 130033
基金项目:国家自然科学基金(批准号:60838005);国家科技重大专项(批准号:2008ZX02501)资助的课题~~
摘    要:理论和实验上研究了Xe介质毛细管放电极紫外光源等离子体时间特性和最佳条件. 从理论上建立了Xe介质一维辐射磁流体力学模型,模拟了不同气压和电流条件下等离子体压缩和辐射特性;实验上测量了放电电流30 kA时不同气压条件下13.5 nm (2%带宽)动态特性. 理论和实验结果表明:不同放电电流条件下,存在最佳气压值,最佳气压随着电流的增加而增加;同时,电流增加时,13.5 nm (2%带宽)辐射光强峰值时刻减小. 关键词: 极紫外光刻光源 毛细管放电 磁流体力学 Xe等离子体

关 键 词:极紫外光刻光源  毛细管放电  磁流体力学  Xe等离子体
收稿时间:2013-07-03

Time behavior and optimum conditions for the Xe gas extreme ultraviolet source
Zhao Yong-Peng;Xu Qiang;Xiao De-Long;Ding Ning;Xie Yao;Li Qi;Wang Qi.Time behavior and optimum conditions for the Xe gas extreme ultraviolet source[J].Acta Physica Sinica,2013,62(24):245204-245204.
Authors:Zhao Yong-Peng;Xu Qiang;Xiao De-Long;Ding Ning;Xie Yao;Li Qi;Wang Qi
Institution:Zhao Yong-Peng;Xu Qiang;Xiao De-Long;Ding Ning;Xie Yao;Li Qi;Wang Qi;National Key Laboratory of Science and Technology on Tunable Laser,Harbin Institute of Technology;Institute of Applied Physics and Computational Mathematics;State Key Laboratory of Applied Optics,Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences;
Abstract:The time behavior and the optimum conditions for the Xe gas capillary discharge extrem ultraviolet source are investigated theoretically and experimentally. By setting up a one-dimensional magneto-fluid-mechanics model, the plasma compressing characteristics and the emission characteristics are simulated under different gas pressures and different discharge currents. The time characteristic and the intensity of the 13.5 nm (2% bandwidth) emission are measured experimentally. The theoretical and experimental results show that there are the optimum gas pressures for different discharge currents. Meanwhile, the optimum gas pressure increases with the discharge current increasing. Moreover, the time to generate the highest 13.5 nm (2% bandwidth) emission should decrease by the increase of the discharge current. All the results should be useful to better understand the plasma condition for the discharge experiments and the EUV source. And it can be used to increase the power of the extreme ultraviolet source as well.
Keywords: extreme ultraviolet source capillary discharge magneto-hydrodynamics Xe plasma
Keywords:extreme ultraviolet source  capillary discharge  magneto-hydrodynamics  Xe plasma
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