Anatase TiO2 films fabricated by pulsed laser deposition using Ti target

TiO₂ films were prepared by pulsed laser deposition using a metallic Ti target in an O₂ gas ambient. The microstructure along with optical and photocatalytic properties of the deposited films were systematically studied by changing the deposition parameters and substrates. It was found that TiO₂ films having nearly pure anatase phase grew effectively in O₂ atmosphere. When the films were fabricated at a substrate temperature of 400°C, their phase structures were greatly affected by the O₂ gas pressure, and nearly pure anatase phase with typical (101) and (004) peaks can be obtained under an O₂ pressure of 15 Pa. For the deposition at 700°C, the crystal structure of the TiO₂ films exhibited a strong anatase (004) peak and was inert to the oxygen pressures. Two modes, namely a substrate-temperature-controlled mode and an oxygen-pressure-controlled mode, were considered for the growth of the anatase TiO₂ films under different substrate temperatures. In addition, the optical and photocatalytic properties were found to be sensitive to both the microstructure and grain size of the TiO₂ films.