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Metastable ion study of organosilicon compounds. Part V—tetramethoxysilane and trimethoxymethylsilane
Authors:Eiichi Tabei  Shigeru Mori  Fumio Okada  Susumu Tajima  Kazuo Ogino  Yuzuru Okawara  Seiji Tobita
Abstract:The fragmentations of tetramethoxysilane ((CH3O)4Si (1)) and trimethoxymethylsilane ((CH3O)3SiCH3 (3)) induced by electron impact were investigated by mass-analysed ion kinetic energy (MIKE) spectrometry and a deuterium-labelling study. These molecular ions begin to fragment by the loss of CH3 or CH3O. These fragmentations are followed by the loss of an aldehyde molecule (H2CO), as commonly observed in the mass spectra of alkoxysilanes. Almost complete scrambling of the methoxy hydrogens takes place in the metastable molecular ion, [1]+˙, prior to the decomposition. On the other hand, a moderate extent of scrambling of the hydrogens takes place in [3]+˙. The fragmentations of [1]+˙ and [3]+˙ were compared with those of the corresponding carbon analogues, tetramethoxymethane ((CH3O)4C (2)) and 1,1,1-trimethoxyethane ((CH3O)3CCH3 (4)), respectively.
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