| Abstract: | A variety of acrylic and methacrylic acetal esters were synthesized by reaction of unsaturated carboxylic acids with vinyl ethers. The acetal esters were converted by radical polymerization and GTP to acid-labile homo- and copolymers. Coatings of these polymeric acetal esters containing photosensitive acid-generating compounds are useful in image-formation through chemical amplification. Thus, poly(tetrahydropyranyl methacrylate-co-benzyl methacrylate) can be used in positive working deep UV microlithography. Poly(tetrahydropyranyl acrylate), coated in a thin layer over a tacky elastomer, provides a high resolution, water-developable negative working tonable composition. Several polymeric and nonpolymeric acetal esters can be used for positive working electrostatic imaging through changes in electrical conductivity. |
