| Abstract: | The continuous miniaturization in microelectronics requires advanced materials and processes. Novel specifically functionalized anhydride-containing filmforming polymers which spontaneously react with bisaminoalkylsiloxanes were synthesized for use in photolithographic processes. This allows the modelling of photoresist patterns and thus enhancement of practical resolution. In addition, efficient polymeric dielectrics with improved solubility in environmentally safe solvents were developed. The latter can be patterned using the above mentioned photolithographic process. |
