Electrochemical synthesis and application of NF3 |
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Authors: | Akimasa Tasaka |
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Affiliation: | Doshisha University, Faculty of Engineering, Department of Molecular Science and Technology, 1-3 Miyako-dani, Tadara, Kyotanabe, Kyoto 610-0321, Japan |
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Abstract: | Electrolytic production of nitrogen trifluoride (NF3) was reviewed. Electrolytic production of NF3 using a nickel anode is more useful method from view points of the yield and purity of NF3, especially, free from carbon tetrafluoride (CF4), but has a few problems to be solved. At present, electrolysis of a molten NH4F-KF-HF system using a carbon anode is developing, because no anode consumption and no storage of nickel sludge in the melt take place.Reaction of NF3 with phosphorus sulfide, preparation of functionally gradient fluorocarbon films and carbonaceous thin films by plasma technique using NF3, and reactive ion etching of Si, SiO2, and SiC using NF3 plasma were reported for the purpose of development on application of NF3. |
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Keywords: | Nitrogen trifluoride Electrochemical fluorination Plasma etching Functional thin film Silicon carbide |
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