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Magnetoresistance in the magnetization reversal process of micropatterned Co wires |
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| Authors: | Y. Shimazu M. Ohkubo K. Morinaga |
| Affiliation: | Department of Physics, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan |
| Abstract: | We measured the magnetoresistance (MR) and magnetization of Co wires of various widths in the range from 0.3 to 200 μm. The observed width dependence of some characteristics of MR is attributed to the change of the domain structure. As the width decreased below 1 μm, an abrupt jump appeared in the longitudinal MR. This can be interpreted as due to an abrupt reversal of the overall magnetization. The measured longitudinal MR was compared with the calculation in the Stoner–Wohlfarth model. |
| Keywords: | Magnetoresistance Magnetization reversal Micromagnetic structures Domain structure |
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