| 将溅射镀膜及薄膜生长动态监测技术引入普通物理实验 |
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| 引用本文： | 黄筱玲,田跃,邱宏. 将溅射镀膜及薄膜生长动态监测技术引入普通物理实验[J]. 物理实验, 2005, 25(5): 28-30 |
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| 作者姓名： | 黄筱玲 田跃 邱宏 |
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| 作者单位： | 北京科技大学,应用科学学院,物理系,北京,100083 |
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| 摘 要： | 金属薄膜的制备及薄膜特性的研究是当今微电子技术发展和材料科学研究领域中的重要课题.本文介绍了如何将溅射镀膜及薄膜生长的动态监测技术引入到普通物理实验教学中,以及在相关实验教学装置的设计、实验内容的编排和教学方式等方面的一些特点.
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| 关 键 词： | 金属薄膜 溅射镀膜 动态监测 教学改革 |
| 文章编号： | 1005-4642(2005)05-0028-03 |
| 修稿时间： | 2004-06-14 |
Introducing dynamic monitoring of sputter-coating and film growth into college physics experiments |
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| HUANG Xiao-ling,Tian Yue,Qiu Hong. Introducing dynamic monitoring of sputter-coating and film growth into college physics experiments[J]. Physics Experimentation, 2005, 25(5): 28-30 |
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| Authors: | HUANG Xiao-ling Tian Yue Qiu Hong |
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| Abstract: | Making of metal films and study of their properties are the important research topics in modern micro-electronic technology and materials science. The techniques for dynamic monitoring of splash-coating and film growth are introduced into the teaching of general physics experiments in college, and the relevant teaching instruments and programs are designed and arranged. |
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| Keywords: | metal film sputter-coating dynamic monitoring teaching reform |
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