| Abstract: | Multi-component micropatterned organosilane monolayers are fabricated on a Si-wafer substrate by stepwise site-specific vacuum ultraviolet (VUV)-ray photodecomposition and chemisorption. The introduction of different organosilane components is confirmed by X-ray photoelectron spectroscopy (XPS). Atomic force microscopic and lateral force microscopic observations reveal that the line-widths of the micropatterned surface correspond to those of the photomask. Contact angle measurement reveals that the micropatterning of the surface functional groups influences the magnitudes of surface free energy. A line pattern with high wetting contrast shows anisotropic water condensing behavior. Also, the patterned surface is used for the site-specific polymerization and site-specific adsorption of microparticles. |
