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Analysis of concentration field formation in titanium under aluminum ion implantation via a gas-and-metal film deposited on a target surface |
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| Authors: | G. A. Vershinin T. S. Grekova G. I. Gering I. A. Kurzina Yu. P. Sharkeev |
| Affiliation: | 1.Omsk State University,Omsk,Russia;2.Tomsk State University of Architecture and Building,Tomsk,Russia;3.Institute of Strength Physics and Materials Science, Siberian Branch,Russian Academy of Sciences,Tomsk,Russia |
| Abstract: | The concentration profiles of aluminum ions in polycrystalline titanium implanted by the polychromatic beam from a vacuum arc source via a gas-and-metal film deposited on a target surface are analyzed. |
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