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OES analysis in a nonthermal plasma used for toxic gas removal: Rotational and excitation temperature estimation
Authors:M. Pacheco  J. Pacheco  H. Moreno  A. Mercado  R. Valdivia  A. Santana
Affiliation:(1) Instituto Nacional de Investigaciones Nucleares, Carretera México-Toluca S/N, La Marquesa Ocoyoacac, Toluca, CP 52750, México;(2) Instituto Tecnológico de Toluca, Av. Instituto Tecnológico de Toluca, Avenida Instituto Tecnológico, Toluca, México;(3) Instituto Tecnológico y de Estudios Superiores de Monterrey, Campus Toluca, Eduardo Monroy Cardenas, Toluca, México
Abstract:Nonthermal plasma technologies are often used for cleaning toxic gases. In this work, we will present an optical emission spectroscopy (OES) study in a dielectric barrier discharge (DBD) used to remove NO x specifically. Rotational temperatures are calculated from the UV-OH band (A 2Σ, ν = 0 → X 2Π ν′ = 0) situated between 306–310 nm; for the rotational temperature, a fitting method was employed (comparison between experimental data with a synthetic molecular spectrum). Excitation temperatures were calculated using OII atomic lines situated in a wavelength range of 300–700 nm using a Boltzman’s plot method. From calculated temperatures, a thermal inequity characteristic of nonthermal plasma discharges has been high-lighted. The influence of the percentage of water added to the DBD reactor is also studied in the removal efficiency and in the OH band intensities and temperatures.
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