| 国际主流光刻机研发的最新进展 |
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| 引用本文： | 袁琼雁,王向朝.国际主流光刻机研发的最新进展[J].激光与光电子学进展,2007,44(1):57-64. |
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| 作者姓名： | 袁琼雁 王向朝 |
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| 作者单位： | 中国科学院上海光学精密机械研究所信息光学实验室,上海,201800;中国科学院研究生院,北京,100039;中国科学院上海光学精密机械研究所信息光学实验室,上海,201800;中国科学院研究生院,北京,100039 |
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| 摘 要： | 介绍了65 nm和45 nm节点国际主流光刻机的最新研发进展,重点分析了目前提高光刻机性能的关键技术,讨论了目前各公司的主流机型及其性能参数,最后简要介绍了下一代光刻技术的研究进展.
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| 关 键 词： | 光刻机 双工件台技术 偏振光照明 折反式物镜 浸没式光刻 下一代光刻 |
| 收稿时间： | 2006/9/4 |
| 修稿时间： | 2006-09-04 |
Recent Development of International Mainstream Lithographic Tools |
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| YUAN Qiongyan,WANG Xiangzhao.Recent Development of International Mainstream Lithographic Tools[J].Laser & Optoelectronics Progress,2007,44(1):57-64. |
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| Authors: | YUAN Qiongyan WANG Xiangzhao |
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| Institution: | 1 Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800 ;2 Graduate University of Chinese Academy of Science, Beijing 100039 |
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| Abstract: | Recent development of the international mainstream lithographic tools for 65 nm and 45 nm processes is described The key technologies to improve performance of lithographic tools are analyzed, The dominating types of lithographic tools as well as their performame parameters are reviewed. Development status of the next generation lithography is discussed briefly. |
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| Keywords: | lithographic tools dual-stage technology polarized illumination catadioptric lens immersion lithography next generation lithography |
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