| 含硅丙烯酸酯化合物光固化性能的研究 |
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| 引用本文： | 孙芳,黄毓礼,A.Korigodski,G.Popova,V.Kireev.含硅丙烯酸酯化合物光固化性能的研究[J].影像科学与光化学,2000,18(3):229-234. |
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| 作者姓名： | 孙芳 黄毓礼 A.Korigodski G.Popova V.Kireev |
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| 作者单位： | 1. 北京化工大学材料科学与工程学院105#, 北京100029;2. 俄罗斯门捷列夫化工大学, 莫斯科125190 |
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| 摘 要： | 本文主要研究含硅丙烯酸酯预聚物ANS的感光性能及光敏剂种类、活性稀释剂丙烯酸 β 羟乙酯 (HEA)用量、预聚体ANS本身结构对ANS感光体系感光性能的影响.发现ANS具有很高光敏性,其紫外响应峰在 334mm处.安息香双甲醚 (651)作为ANS的光引发剂,引发效果最好.活性稀释剂HEA可以降低体系的粘度,提高光固化膜透光率,调解光固化物的性能.预聚体结构不同,其感光性能有着很大差别.
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| 关 键 词： | 有机硅 丙烯酸酯 光固化 |
| 收稿时间： | 1999-10-29 |
THE STUDY OF PHOTOSENSITIVITY OF Si CONTAINING ACRYLIC COMPOUND |
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| SUN Fang,HUANG Yu-li,A.Korigodski,G.Popova,V.Kireev.THE STUDY OF PHOTOSENSITIVITY OF Si CONTAINING ACRYLIC COMPOUND[J].Imaging Science and Photochemistry,2000,18(3):229-234. |
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| Authors: | SUN Fang HUANG Yu-li AKorigodski GPopova VKireev |
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| Institution: | 1. School of Material Science and Engineering of Beijing University of Chemical Technology 105#, Beijing 100029, P.R.China;2. D.Mendeleyev University of Chemical Technology of Russia, Mosccow, 125190, Russia |
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| Abstract: | The photosensitivity of Si containing acrylic oligomer ANS was investigated in terms of photoinitiators, the quantity of reactive diluent hydroxyethylacrylate (HEA) and the structure of ANS.It was shown that ANS has considerable photosensitivity. UV spectrum shows an absorption of λ max at 334 nm.The curing systems have the high curing rate when using 2,2 dimethoxy 2 phenylacetophenone (Iragacure 651) as the photoinitiator. The role of reactive diluent HEA is to decrease the viscosity of the curing systems, to improve the transparency of the cured film, and to optimize the property of the cured products.The photosensitivity has large variety when oligomers having different structures. |
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| Keywords: | polysiloxane acrylic oligomer UV curing |
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