具有辐射聚合能力的HfO2/SiO2溶胶-凝胶玻璃的制备及其X射线光刻性能研究

采用溶胶-凝胶方法制备了一种新颖的具有辐射聚合能力的HfO2/SiO2凝胶薄膜. 并采用X射线作曝光光源对薄膜进行了曝光, 通过FTIR的测试, 分析了薄膜曝光前后的结构变化. 结果表明, 该材料具有良好的辐射聚合能力. 采用XPS分析了薄膜的成分, 并证实了Hf元素的存在. 用椭偏仪测试了薄膜的折射率, 结果证实, 加入HfO2提高了体系的折射率. 利用其辐射聚合能力, 采用X射线通过掩模板进行曝光, 利用曝光部分与未曝光部分在溶剂中的溶解度差, 在薄膜上制备了高为0.8 μm、周期为1 μm的衍射光栅, 进一步证实了材料具有良好的辐射聚合能力.

Preparation of HfO2-SiO2 Sol-gel with Radiation Polymerization Property Glass and Studies on Property of X-Ray Lithography

The novel HfO2/SiO2 gel films with property of radiation polymerization were prepared by means of sol-gel technique. The film was exposed to X-ray irradiation and the structural change in the hybrid glass thin film was monitored by Fourier transform infrared(FTIR) sectroscopy, polymerization was clearly evidenced in the mid-IR spectra by the loss of intensity of the vinyl group ν(C=C) mode at 1638 cm-1. The Hafnium element in the film was detected by X-ray photoelectron spectroscopy(XPS). The atomic percentages obtained by XPS were 1.96%(Hf), 10.49%(Si), 27.63%(O), 59.91%(C), respectively. XPS result shows that the atomic ratio of Si to Hf is about 5∶1. The refractive indexes of the film at different wavelengths were also measured by the ellipsometer, which showed that they were raised. Because of the solubility difference between the exposed part and unexposed part, after the film was exposed through the mask by X-ray irradiation, a grating, with a highness of 0.8 μm and a period of 1 μm, was fabricated in the HfO2/SiO2 sol-gel glass, which showed that the film has a good property of radiation polymerization.