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On oxygen diffusion in poly(methyl methacrylate) films
Authors:Vladimir L. Vyazovkin   Valery V. Korolev   Vladimir M. Syutkin  Vladimir A. Tolkatchev
Affiliation:(1) Institute of Chemical Kinetics and Combustion, Novosibirsk, 630090, Russia
Abstract:ESR spectroscopy has been used to follow the kinetics of decay of radicals produced by UV-radiation in PMMA films upon exposure to oxygen in the temperature range 160-210 K. In the same films and at the same conditions, decay kinetics of phenanthrene phosphorescence has been studied at 180-220 K. Both types of the experiments give the same values for diffusion coefficients of oxygen in PMMA. Thus, from the oxygen diffusion standpoint, the sites of the radical stabilization and phenanthrene molecule localization in the polymer matrix do not differ.
Keywords:luminescence quenching  radical oxidation  Poly(methyl methacrylate)  oxygen diffusion  low temperatures
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