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SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONS
Authors:Li Hong-wei and Zhou Jun-ming
Affiliation:Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
Abstract:Single electron transistors with wire channels are fabricated by a nanoelectrode-pair technique. Their characteristics strongly depend on the channel widths and the voltages on the in-plane gates. A few dips in the Coulomb blockade oscillations were observed at the less positive gate voltages for a device with a 70nm-wide wire due to Coulomb blockade between the coupled dots. By applying negative voltages to the in-plane gates, the oscillations became periodic, which indicated the formation of a single dot in the conducting channel. These gates facilitate fabricating single-electron transistors with single dot structures, which have potential applications on its integration.
Keywords:single-electron tunneling   Coulomb blockade   quantum dots
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