Synthesis and lithographic applications of highly metallized cluster-based polyferrocenylsilanes

We report the use of a cobalt-clusterized polyferrocenylsilane (Co-PFS) as a precursor to patterned ferromagnetic ceramics. Co-PFS was synthesized. Functioning as a negative resist, Co-PFS lines with widths of 10-300 μm were patterned using UV-photolithography, while features as small as 500 nm were afforded by electron-beam lithography. Subsequent pyrolytic treatment of the lithographically patterned Co-PFS yielded ferromagnetic ceramics containing Fe/Co nanoparticles. Due to its high metal-loading, Co-PFS is a good etch resist for oxygen and hydrogen plasma reactive ion etching. Reactive ion etching of a thin film of Co-PFS in a secondary magnetic field allowed direct access to ferromagnetic ceramic films, providing a viable alternative to pyrolysis.