On the reaction kinetics in laser-induced pyrolytic chemical processing

Reaction rates, particle densities, and temperature distribution in pyrolytic (photothermal) laser-induced microchemical processing are investigated with respect to temperature and concentration-dependent transport coefficients, and with respect to the effect of thermal diffusion. While the model employed is particularly suitable for laser-induced chemical vapor deposition (LCVD), it can also be applied to many cases of laser-induced surface modification and dry-etching.On leave from: General Physics Institute, Academy of Sciences, SU-117942 Moscow, USSR