Corrigendum to: “Growth of crystalline quartz films with AT-cut plane by means of catalyst-enhanced vapor-phase epitaxy under atmospheric pressure” [J. Phys. Chem. Solids 66 (7) (2005) 1145-1149]
a Department of Materials Science and Technology, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatus, Shizuoka 432-8561, Japan b Humo Laboratory Company, 5-9-11 Nishiogi-Kita, Suginami-ku, Tokyo 167-0042, Japan