| Abstract: | Stacking faults and thin deformation twins are observed to develop during the in-situ deformation of silicon crystals at elevated temperatures in a HVEM. Both the nucleation and the motion of partial dislocations take place under the applied stress in the regions of the stress concentration. Twinning dislocations moving on twin boundaries are extremely flexible. The spontaneous nucleation of loops of twinning dislocation on twin boundaries is observed rather frequently. No pole mechanism is observed to be operating. Stacking faults and deformation twins interact with glide dislocations moving along the intersecting planes by various ways. |
