Magnetic disturbance compensation for a reticle stage in a lithographic tool |
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Authors: | Hans Butler |
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Institution: | ASML, Mechatronic Systems Development, P.O. Box 324, 5500 AH Veldhoven, The Netherlands |
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Abstract: | The wafer stage and reticle stage in a lithographic tool, used to manufacture integrated circuits, operate at nanometer accuracy during a scanning motion. Magnetic interaction with the environment causes disturbance forces that result in a 5 nm moving-average filtered scanning error of the reticle stage.Stage motor magnet interaction with ferromagnetic material in the vicinity causes a position-dependent disturbance force, and eddy currents in electrically conductive metals cause a position-dependent damping force which is proportional with velocity.The total disturbance force can be estimated from control-loop signals, and by moving the stage in both directions both disturbance types can be distinguished from each other and recorded in compensation tables. Applying these tables as a feedforward reduces the scanning position error from 5 nm to 1.8 nm in a production reticle stage system. |
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Keywords: | Reticle stage Lithography Feedforward Magnetic interaction |
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