| 低温多晶硅薄膜制备技术应用进展 |
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| 引用本文： | 杨定宇,蒋孟衡,涂小强.低温多晶硅薄膜制备技术应用进展[J].电子元件与材料,2007,26(8):8-11. |
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| 作者姓名： | 杨定宇 蒋孟衡 涂小强 |
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| 作者单位： | 成都信息工程学院,光电技术系,四川,成都,610225;成都信息工程学院,光电技术系,四川,成都,610225;成都信息工程学院,光电技术系,四川,成都,610225 |
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| 基金项目： | 四川省应用基础研究计划 |
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| 摘 要： | 系统介绍了金属诱导横向晶化法、准分子激光晶化法、触媒化学气相沉积法(Cat-CVD)以及电感耦合等离子体化学气相沉积法(ICP-CVD)制备低温多晶硅薄膜的原理及进展。对不同制备工艺的优势和不足进行了比较,重点讨论了Cat-CVD和ICP-CVD在实用化中需克服的技术问题。对上述制备方法的应用前景作了评述和展望。
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| 关 键 词： | 半导体技术 低温多晶硅薄膜 综述 金属诱导横向晶化 准分子激光晶化 触媒化学气相沉积 电感耦合等离子体化学气相沉积 |
| 文章编号： | 1001-2028（2007）08-0008-04 |
| 修稿时间： | 2007-03-07 |
Application progress on the preparation of low temperature polysilicon films |
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| YANG Ding-yu,JIANG Meng-heng,TU Xiao-qiang.Application progress on the preparation of low temperature polysilicon films[J].Electronic Components & Materials,2007,26(8):8-11. |
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| Authors: | YANG Ding-yu JIANG Meng-heng TU Xiao-qiang |
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| Institution: | Chengdu University of Information Technology, Chengdu 610225, China |
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| Abstract: | The principles and progress of LTPS preparation methods including metal induced lateral crystallization(MILC),excimer laser annealing(ELA),catalytic chemical vapor deposition(Cat-CVD) and inductively coupled plasma chemical vapor deposition(ICP-CVD) were systematically introduced.Then,the advantages and shortcomings of different processes were compared with each other.Discussed were several problems of Cat-CVD and ICP-CVD in practical applications.Finally,a brief review and application prospect of above-mentioned methods are also presented. |
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| Keywords: | semiconductor technology LTPS review MILC ELA Cat-CVD ICP-CVD |
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