Raman scattering in hydrogenated amorphous silicon under high pressure

The first studies on the pressure dependences of the first-order Raman spectra in plasma-deposited a-Si:H films are reported. With increasing pressure up to 25 kbar the TO optical phonon band shows a shift in peak to higher frequencies with a sharpening of width while the TA acoustic phonon band shows a shift in peak to lower frequencies with a broadening of width. The LO optical phonon band shows a shift in peak to higher frequencies whereas the LA acoustic phonon band remains unchanged. These pressure effects are discussed with changes in force constant and structural disorder. The alloying effect of H atoms on the Raman spectra is also discussed while comparing the pressure effects.