首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Photo-oxidative degradation mechanisms in styrene-ethylene-butadiene-styrene (SEBS) triblock copolymer
Authors:Cristina Luengo  Michele Edge  M Dolores Parellada  V Ruiz Santa
Institution:
  • a Chemistry and Materials Department, Faculty of Science and Engineering, The Manchester Metropolitan University, Chester Street, Manchester M1 5GD, UK
  • b Repsol-YPF, Carretera de Extremadura, N-V. Km. 18, 28931 Mostoles, Spain
  • Abstract:The photo-oxidative degradation of polystyrene-b-ethylene-co-butylene-b-styrene], SEBS, has been studied at wavelengths cut-off below 290 nm, and monochromatic light of 254 nm and 365 nm, using a variety of spectroscopic methods including FTIR, UV and luminescence spectroscopy coupled with crosslinking and hydroperoxide analyses in order to understand the mechanisms involved. A study on polystyrene photodegradation is also compared at varying wavelengths in order to provide an understanding of the light sensitivity of the styrene vs the aliphatic phases in the SEBS. The increase in colour shows evidence for the presence of visible light absorbing chromophores. Hydroperoxide analysis reflects a rapid increase in the hydroperoxide concentration in the olefinic phase. Fluorescence spectroscopy shows a rapid disruption of the polystyrene excimers coupled with the formation of long-wavelength emitting polyconjugated stilbene-type chromophores. Phosphorescence analysis indicates the presence of acetophenone groups while GPC and sol/gel analysis showed that degradation occurs mainly due to chain scission. Changes in the FTIR spectra of the photo-oxidised samples show a predominant absorption associated with carboxylic acids and/or aliphatic esters at 1712 cm−1. Other species such as hydroperoxides, ketones and α,β-unsaturated carbonyls are also formed and mechanisms are proposed.
    Keywords:SEBS  Elastomers  Photo-oxidation  Luminescence  Infra-red analysis
    本文献已被 ScienceDirect 等数据库收录!
    设为首页 | 免责声明 | 关于勤云 | 加入收藏

    Copyright©北京勤云科技发展有限公司  京ICP备09084417号