Chemical states of GeTe thin-film during structural phase-change by annealing in ultra-high vacuum |
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Authors: | C. Ko Y. M. Lee H. J. Shin M.-C. Jung M. Han K. Kim J. C. Park S. A. Song H. S. Jeong |
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Affiliation: | (1) Center for Applied Near-Field Optics Research, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562 Ibaraki, Japan;(2) Center for Applied Near-Field Optics Research, CAN-FOR, National Institute of Advanced Industrial Science and Technology, AIST, Tsukuba Central 4 1-1-1 Higashi, 3.5-8562 Tsukuba, Japan |
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Abstract: | The chemical states of GeTe thin film are investigated using high-resolution X-ray photoelectron spectroscopy (HRXPS) with synchrotron radiation, during amorphous to crystalline structural phase transition. As the temperature increases from 250 to 400 °C, we observe the rock-salt crystalline structure and phase with X-ray diffraction (XRD) and transmission electron microscopy (TEM). Spin-orbit splitting of the Ge 3d core-level spectrum clearly appears after annealing at 400 °C for 5 min. However, the binding energy of the Ge 3d5/2 core-level peak of 29.8 eV does not change in the amorphous to crystalline structural phase transition. In the case of the Te 4d core-level, change in binding energy and peak shapes is also negligible. We assume that the Te atom is fixed at a site between the amorphous and crystalline phases. Although the structural environment of the Ge atoms changes during the structural phase transition, the chemical environment does not. |
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Keywords: | KeywordHeading" >PACS 81.05.Gc Amorphous semiconductors 79.60.Bm Clean metal, semiconductor, and insulator surfaces 82.80.Pv Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.) |
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