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Chemical states of GeTe thin-film during structural phase-change by annealing in ultra-high vacuum
Authors:C. Ko  Y. M. Lee  H. J. Shin  M.-C. Jung  M. Han  K. Kim  J. C. Park  S. A. Song  H. S. Jeong
Affiliation:(1) Center for Applied Near-Field Optics Research, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562 Ibaraki, Japan;(2) Center for Applied Near-Field Optics Research, CAN-FOR, National Institute of Advanced Industrial Science and Technology, AIST, Tsukuba Central 4 1-1-1 Higashi, 3.5-8562 Tsukuba, Japan
Abstract:The chemical states of GeTe thin film are investigated using high-resolution X-ray photoelectron spectroscopy (HRXPS) with synchrotron radiation, during amorphous to crystalline structural phase transition. As the temperature increases from 250 to 400 °C, we observe the rock-salt crystalline structure and phase with X-ray diffraction (XRD) and transmission electron microscopy (TEM). Spin-orbit splitting of the Ge 3d core-level spectrum clearly appears after annealing at 400 °C for 5 min. However, the binding energy of the Ge 3d5/2 core-level peak of 29.8 eV does not change in the amorphous to crystalline structural phase transition. In the case of the Te 4d core-level, change in binding energy and peak shapes is also negligible. We assume that the Te atom is fixed at a site between the amorphous and crystalline phases. Although the structural environment of the Ge atoms changes during the structural phase transition, the chemical environment does not.
Keywords:  KeywordHeading"  >PACS 81.05.Gc Amorphous semiconductors  79.60.Bm Clean metal, semiconductor, and insulator surfaces  82.80.Pv Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)
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